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                                         2006 
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                                        A. Gloskovskii, S. A. Nepijko, M. Cinchetti, G. Schönhense, G. H. Fecher, H. C. Kandpal, C. Felser, H. A. Therese, N. Zink, and W. Tremel; Time-of-flight photoelectron spectromicroscopy of single MoS2 nanotubes; J. Appl. Phys. 100 (2006) 084330 | 
                                 
                                
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                                         2004 
                                         
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                                                    M.D. v. Przychowski, G.K.L.Marx, G.H.Fecher, and G. Schönhense; A Spatially Resolved Investigation of Oxygen Adsorption on Polycrystalline Copper and Titanium by Means of Photoemission Electron Microscopy; Surf. Sci. 549 (2004) 37
                                                    A.Oelsner, A.Krasyuk, G.H.Fecher, C.M.Schneider, and G.Schönhense; Image Enhancement in Photoemission Electron Microscopy by  means of Imaging Time-of-Flight Analysis; J. Electron Spectrosc. Relat.  Phenom 137-140 (2004) 757 | 
                                             
                                         
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                                         2003 
                                         
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                                                     M.Chinchetti, A.Oelsner, G.H.Fecher, H.J.Elmers, and G.Schönhense; Observation of Cu surface inhomogeneities by Multiphoton Photoemission Spectro-Microscopy; Appl.Phys.Lett. 83 (2003) 1503
                                                    M.Chinchetti, A.V.Gloskowskii, D.A.Valdaitsev, A.Oelsner, G.H.Fecher, S.A.Nepijko, H.-J.Elmers, and G.Schönhense;Emission Electron Microscopy of Nanoparticles in Strong fs Laser Fields; Microsc. Microanal. 9 (Suppl. 3) (2003) 168  | 
                                             
                                         
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                                         2002 
                                         
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                                                     S.A.Nepijko, N.N.Sedov, O.Schmidt, G.H.Fecher, E.I.Smirnov, and G.Schönhese; Imaging of three-dimensional islands by means of photoemission electron microscopy; Annal.Phys. 11 (2002) 39
                                                    A.Oelsner, Ch.Ziethen, G.H.Fecher, and G.Schönhense; Imaging of Dichroism in Photoemission Electron Microscopy at Non-magnetic Materials Using Circularly Polarized Light;Surf.Rev.Lett.9 (2002) 509
                                                    G.H.Fecher, O.Schmidt, Y.Hwu, and G.Schönhense; Multiphoton Photoemission Electron Microscopy Using Femtosecond Laser Radiation; J.Elec.Spec.Rel.Phen. 128 (2002) 77  | 
                                             
                                         
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                                         2001 
                                         
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                                                    G.Schönhense, A.Oelsner, O.Schmidt, G.H.Fecher, V.Merkel, O.Jagutzki, and H.Schmidt-Böcking; Time-of-Flight Photoemission Electron Microscopy - A New way to Chemical Surface Analysis; Surf.Sci.  480 (2001) 180
                                                    Y.Hwu, W.L.Tsai, B.Lai, J.H.Je, G.H.Fecher,  M.Bertolo, and G.Margaritondo; Using Photoelectron Emission Microscopes  with Hard X-rays; Surf.Sci. 480 (2001) 188
                                                    O.Schmidt and G.H.Fecher; The Lateral Variation of Solid State Reactions at Surfaces Studied by Means of Photoemission Electron Microscopy: Formation of Titanium Silicides; Surf.Sci. 482-485 (2001) 335
                                                    O. Schmidt, T.A.Fazan, J.Morais, and G.H.Fecher; Microanalysis of the Surfaces of Natural Iron-Based Minerals by Means of Synchrotron Radiation Based Experimental Techniques; Surf.Sci.  482-485 (2001) 568
                                                    O.Schmidt, G.H.Fecher, Y.Hwu, and  G.Schönhense; The Spatial Distribution of Non-Linear  Effects in Multi-Photon Photoemission of Adsorbates on Si(111); Surf.Sci. 482-485 (2001) 687
                                                    C.M.Schneider, O. de Haas, U.Muschiol, N.Cramer, A.Oelsner, M.Klais, O.Schmidt, G.H.Fecher, W.Jark, and G.Schönhense;Photoemission Microscopy from Magnetically Coupled Thin Film Systems; J.Magn.Magn.Mat. 233 (2001) 14 | 
                                             
                                         
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                                         1999 
                                         
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                                                    G.H.Fecher and Y.Hwu; Photoabsorption and MXCD in Photoemission Microscopy for Characterisation of Advanced Materials; Jpn.J.Appl.Phys. 38 (1999) S 313
                                                    G.H.Fecher, Y.Hwu, Y.-D.Yao, Y.-Y.Lee, G.M.Chow, W.Swiech; Photoabsorption and MXCD in Photoemission Microscopy for Characterization of Advanced Materials; J.Elec.Spec.Rel.Phen.101-103 (1999) 937
                                                    W.Grahneis, Ch.Ziethen, G.H.Fecher,  and G.Schönhense; Combined Chemical Microanalysis using SAM and X-PEEM; Jpn.J.Appl.Phys. 38 (1999) S 317
                                                    Y.Hwu, W.-L. Tsai, D.Y.Noh, J.H.Je,  G.H.Fecher, M.Bertolo, H.Berger, and G.Margaritondo; The Development  and Application of Imaging EXAFS Spectromicroscopy; Jpn.J.Appl.Phys. 38 (1999) S 646
                                                    U.Kleineberg, D.Menke, F.Hamelmann,  U.Heinzmann, O.Schmidt, G.H.Fecher, G.Schönhense; Photoemission  Microscopy with Microspot-XPS by Use of Undulator Radiation and a High-Throughput Multilayer Monochromotar at BESSY; J.Elec.Spec.Rel.Phen. 101-103 (1999) 931
                                                    
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                                         1998 
                                         
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                                                    G.H.Fecher, M.Huth, Y.Hwu, W.Swiech;Photoemission micro-imaging and -spectroscopy of devices made from complex materials; Eds.: H.A.C. Benavides and M.J.Yacaman;Electron Microscopy 1998, Vol.II, Material Science 1, p.321; IOP, Bristol and Philadelphia (1998)
                                                    O.Schmidt, Ch.Ziethen, G.H.Fecher, M.Merkel, M.Escher, D.Menke, U.Kleineberg, U.Heinzmann, G.Schönhense;Chemical Microanalysis by Selected-area ESCA using an Electron Energy Filter in a Photoemission Microscope; J.Elec.Spec.Rel Phen.88-91 (1998) 1009
                                                    W.Swiech, R.Frömter, C.M.Schneider, W.Kuch, Ch.Ziethen, O.Schmidt, G.H.Fecher, G.Schönhense, J.Kirschner;Magnetically Resolved and element specific imaging with photoelectrons using an immersion lens column; Eds.: H.A.C. Benavides and M.J.Yacaman; Electron Microscopy 1998, Vol.II, Material Science 1, p.511; IOP, Bristol and Philadelphia (1998)
                                                    W.Swiech, G.H.Fecher, M.Huth, O.Schmidt  , N.-F.Cheng, C.-K. Lin, C.-Y.Tung, Y.Hwu; Photo-Absorption Spectromicroscopy  as a Microchemical Probe to Characterize Devices Made of Complex Materials; Appl.Phys. A67 (1998)
                                                    Ch.Ziethen, O.Schmidt, G.H.Fecher, C.M.Schneider, G.Schönhense, R.Frömter, M.Seider, K.Grzelakowski M.Merkel, D.Funnemann, W.Swiech, H.Gundlach, J.Kirschner; Fast elemental Mapping and Magnetic Imaging with High Lateral Resolution Using a Novel Photoemission Microscope; J.Elec.Spec.Rel Phen. 88-91 (1998) 983
                                                    
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                                         1997 
                                         
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                                                    G.H.Fecher, Y.Hwu, W.Swiech; Chemical Microimaging and Microspectroscopy of Surfaces with a Photoemission Microscope; Surf Sci. 377-379 (1997) 1106
                                                    C.M.Schneider, R.Frömter, W.Swiech,Ch.Ziethen,O.Schmidt, G.H.Fecher, G.Schönhense, J.Kirschner; Magnetic Spectromicroscopy and Microspectroscopy with Submicrometer  Resolution, J.Appl.Phys. 81 (1997) 5020
                                                    W.Swiech, G.H.Fecher, Ch.Ziethen,  O.Schmidt, G.Schönhense, K.Grzelakowski, C.M.Schneider, R.Frömter,  H.P.Oepen, J.Kirschner; Recent Progress in Photoemission Microscopie  with Emphasis on Chemical and Magnetic Sensitivity; J.Elec.Spec.Rel.Phen. 84 (1997) 171
                                                    
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                                         1994 
                                         
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                                                    S.Corvers, G.H.Fecher, K.Bange, O.Anderson, W.Gutmannsbauer, H.Haefke; Thin oxide films: An AFM and TEM study; Glastech.Ber. Glass Sci.Technol 67 C (1994) 484
                                                    G.H.Fecher, J.Bansmann, Ch.Grünewald, A.Oelsner, Ch.Ostertag, G.Schönhense; Oxidation of rubidium at platinum (111); Surf.Sci. 307-309 (1994) 70
                                                    
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                                         copyright: g.h. fecher @ 1999 - 2007;  last updated: 23. Sept. 2007 
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